Improvement of scanning probe microscopy local oxidation nanolithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 27, Issue 2, 2009, Pages 948-952

  Nishimura, Shinya ^a   Toyofuku, Takashi ^a   Miyashita, Kazuya ^a   Takemura, Yasushi ^b   Shirakashi, Jun Ichi ^a  

^a TOKYO UNIVERSITY OF AGRICULTURE AND TECHNOLOGY   (Japan)

^b YOKOHAMA NATIONAL UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COMPARATIVE STUDIES; CONTACT MODES; ELECTRIC FIELD STRENGTHS; LOCAL OXIDATIONS; MODEL-BASED; OXIDATION CONDITIONS; OXIDATION REACTIONS; SCANNING PROBES; SI OXIDES; SPACE CHARGES; STANDARD DEVIATIONS; TAPPING MODES; TAPPING-MODE OPERATIONS;

ELECTRIC FIELDS; FULL WIDTH AT HALF MAXIMUM; NANOLITHOGRAPHY; PROBES; RATE CONSTANTS; SCANNING; SCANNING ELECTRON MICROSCOPY; SCANNING PROBE MICROSCOPY; SPACE PROBES;

OXIDATION;

EID: 64549155364     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3093907     Document Type: Article

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