0.1-nanometer resolution positioning stage for sub-10 nm scanning probe lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 8680, Issue , 2013, Pages

  Vorbringer Doroshovets, Nataliya ^a   Balzer, Felix ^a   Fuessl, Roland ^a   Manske, Eberhard ^a   Kaestner, Marcus ^a   Schuh, Andreas ^a   Zoellner, Jens Peter ^a   Hofer, Manuel ^a   Guliyev, Elshad ^a   Ahmad, Ahmad ^a   Ivanov, Tzvetan ^a   Rangelow, Ivo W ^a  

^a ILMENAU UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

Abbe error free measurement; Closed loop lithography; Maskless patterning; Nanolithography; Nanopositioning and Nanomeasuring Machine (NPM); Scanning probe lithography

Indexed keywords

ABBE ERRORS; CLOSED LOOPS; MASKLESS PATTERNING; NANOPOSITIONING AND NANOMEASURING MACHINES; SCANNING PROBE LITHOGRAPHY;

LITHOGRAPHY; NANOELECTRONICS; NANOLITHOGRAPHY;

PRECISION ENGINEERING;

EID: 84878413322     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.2012324     Document Type: Conference Paper

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