Evaluation of hybrid lithography and mix and match scenarios for electron beam direct write applications

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 25, Issue 6, 2007, Pages 2038-2040

  Hohle, C ^a   Arndt, C ^a   Choi, K H ^a   Kretz, J ^a   Lutz, T ^a   Thrum, F ^a   Keil, K ^b  

^a QIMONDA DRESDEN GMBH AND CO OHG   (Germany)

^b Fraunhofer Center Nanoelectronic Technologies   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

RANDOM ACCESS STORAGE; SENSITIVITY ANALYSIS; ULTRAVIOLET DEVICES; VACUUM;

ETCH RESISTANCE; PROCESS WINDOW EVALUATION; VACUUM STABILITY;

ELECTRON BEAM LITHOGRAPHY;

EID: 37149018006     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2779043     Document Type: Article

References (4)

1. L. Pain, Jpn. J. Appl. Phys., Part 1 43, 3755 (2004).
2. F. Thrum, Proc. SPIE 6533, 65330K-1 (2007).
3. L. Pain, J. Vac. Sci. Technol. B 18, 3388 (2000).
4. D. Lennon, S. Spector, T. Fedynyshyn, T. Lyszczarz, M. Rothschild, J. Thackeray, and K. Spear-Alfonso, Proc. SPIE 6519, 65190H-1 (2007).