Multi-step Scanning Probe Lithography (SPL) on calixarene with overlay alignment

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 8323, Issue , 2012, Pages

  Kaestner, M ^a   Rangelow, I W ^a  

^a ILMENAU UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

calixarene; closed loop lithography; molecular resist; nanofabrication; nanoprobe maskless lithography; Scanning Probe Lithography; self developing resist; SPL

Indexed keywords

NANOPROBES; NANOTECHNOLOGY; PHENOLS;

CALIXARENES; CLOSED LOOPS; MASK-LESS LITHOGRAPHY; MOLECULAR RESISTS; SCANNING PROBE LITHOGRAPHY; SELF-DEVELOPING RESIST; SPL;

LITHOGRAPHY;

EID: 84865509404     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.916263     Document Type: Conference Paper

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