Patterning polymeric structures with 2 nm resolution at 3 nm half pitch in ambient conditions

Nano Letters

Volumn 7, Issue 7, 2007, Pages 1846-1850

  Martinez R V ^a   Losilla, N S ^a   Martinez J ^a   Huttel, Y ^b   Garcia, R ^a  

^a INSTITUTO DE MICROELECTRÓNICA DE MADRID   (Spain)

^b INSTITUTO DE CIENCIA DE MATERIALES DE MADRID   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CROSSLINKING; LITHOGRAPHY; OPTICAL RESOLVING POWER; PHOTOELECTRON SPECTROSCOPY; POLYMERIZATION; SILICON;

NANOSCALE OCTANE MENISCUS; OCTANE MOLECULES; ORGANIC STRUCTURES; PARALLEL PATTERNING;

POLYMERS;

POLYMER; SILICON;

ATMOSPHERIC PRESSURE; ATOMIC FORCE MICROSCOPY; NANOTECHNOLOGY; REVIEW; TEMPERATURE;

ATMOSPHERIC PRESSURE; MICROSCOPY, ATOMIC FORCE; NANOTECHNOLOGY; POLYMERS; SILICON; TEMPERATURE;

EID: 34547579004     PISSN: 15306984     EISSN: None     Source Type: Journal    
DOI: 10.1021/nl070328r     Document Type: Article

References (32)

1. Sotomayor Torres, C. M. Alternative Lithography: Unleasing Potentials of Nanotechnology; Nanostructure Science and Technology; Kluwer Academic/Plenum Publishers: New York 2003.
2. Gates, B. D.; Xu, Q. B.; Love, J. C.; Wolfe, D. B.; Whitesides, G. M. Annu. Rev. Mater. Res. 2004, 34, 339.
3. Geissler, M.; Xia, Y. N. Adv. Mater. 2004, 16, 1249.
4. Binnig, G.; Rohrer, H. Rev. Mod. Phys. 1999, 71, S324.
5. Kim, F.; Kwan, S.; Akana, J.; Yang, P. D. J. Am. Chem. Soc. 2001, 123, 4360.
6. Rothemund, P. W. K. Nature 2006, 440, 297.
7. Bratton, D.; Yang, D.; Dai, J. Y.; Ober, C. K. Polym. Adv. Technol. 2006, 17, 94.
8. Van Dorp, W. F.; Van Someren B.; Hagen C. W. Nano Lett. 2005, 5, 1303.
9. Word, M. J.; Adesida, I.; Berger, P. R. J. Vac. Sci. Technol., B 2003, 21, L12.
10. Saifullah, M. S. M.; Subramanian, K. R. V.; Kang, D.-J.; Anderson, D.; Huck, W. T. S.; Jones, G. A. C.; Weiland, M. E. Adv. Mater. 2005, 17, 1757.
11. Chou, S. Y.; Krauss, P. R.; Renstrom, P. J. Appl. Phys. Lett. 1995, 67, 3114.
12. Garcia, R.; Martinez, R. V.; Martinez, J. Chem. Soc. Rev. 2006, 35, 29.
13. Cavallini, M.; Biscarini, F.; Léon, S.; Zerbetto, F.; Bottari, G.; Leigh, D. A. Science 2003, 299, 531.
14. Whitesides, G. M.; Ostuni, E.; Takayama, S.; Jiang, X. Y.; Ingber, D. E. Annu. Rev. Biomed. Eng. 2001, 3, 335.
15. Liu, S. T.; Maoz, R.; Sagiv, J. Nano Lett. 2004, 4, 845.
16. Ginger, D. S.; Zhang, H.; Mirkin, C. A. Angew. Chem., Int. Ed. 2004, 43, 30.
17. Crommie, M. F.; Lutz, C. P.; Eigler, D. M. Science 1993, 262, 218.
18. Sugimoto, Y.; Abe, M.; Hirayama, S.; Oyabu, N.; Custance, O.; Morita, S. Nat. Mater. 2005, 4, 156.
19. Liu, J. F.; Von, Ehr, J. R.; Baur, C.; Stallcup, R.; Randall, J.; Bray, K. Appl. Phys. Lett. 2004, 84, 1359.
20. Cho, Y.; Hashimoto, S.; Odagawa, N.; Tanaka, K.; Hiranaga, Y. Nanotechnology 2006, 17, S137.
21. Tello, M.; Garcia, F.; Garcia, R. J. Appl. Phys. 2002, 92, 4075.
22. Garcia, R. G. Appl. Phys. Lett. 1992, 60, 1960.
23. Austin, M. D.; Zhang, W.; Ge, H. X.; Wasserman, D.; Lyon, S. A.; Chou, S. Y. Nanotechnology 2005, 16, 1058.
24. Tello, M.; Garcia, R.; Martín-Gago, J. A.; Martinez, N. F.; Martín-González, M. S.; Aballe, L.; Baranov, A.; Gregoratti, L. Adv. Mater. 2005, 17, 1480.
25. Martin-Gonzalez, M. S.; Huttel, Y.; Cebollada, A.; Armelles, G.; Briones, F. Surf. Sci. 2004, 571, 63.
26. Cavallini, M.; Mei, P.; Biscarini, F.; Garcia, R. Appl. Phys. Lett. 2003, 83, 5286.
27. Martinez, J.; Losilla, N. S.; Biscarini, F.; Schmidt, G.; Borzenko, T.; Molenkamp, L. W.; Garcia, R. Rev. Sci. Instrum. 2006, 77, 086106.
28. Keller, D. Surf. Sci. 1991, 253, 353.
29. Suez, I.; Backer, S. A.; Frechet, J. M. J. Nano Lett. 2005, 5, 321. Martinez, R. V.; Garcia, R. Nano Lett. 2005, 5, 1161.
30. Okpalugo, T. I. T.; Papakonstantinou, P.; Murphy, H.; McLaughlin, J.; Brown, N. M. D. Carbon 2005, 43, 153.
31. Haerle, R.; Riedo, R.; Pasquarello, A.; Baldereschi, A. Phys. Rev. B 2001, 65, 045101.
32. Xie, X. N.; Deng, M.; Xu, H.; Yang, S. W.; Qi, D. C.; Gao, X. Y.; Chung, H. J.; Sow, C. H.; Tan, V. B. C.; Wee, A. T. S. J. Am. Chem. Soc. 2006, 128, 2738.