Rapid turnaround scanning probe nanolithography

Nanotechnology

Volumn 22, Issue 27, 2011, Pages

  Paul, Philip C ^a   Knoll, Armin W ^a   Holzner, Felix ^a   Despont, Michel ^a   Duerig, Urs ^a  

^a IBM RESEARCH ZURICH   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

FREQUENCY BAND WIDTH; METROLOGY SYSTEMS; NANOPATTERNING; ORGANIC RESIST; POSITIONING ACCURACY; SCANNING PROBE NANO-LITHOGRAPHY; THERMO-MECHANICAL; TOPOGRAPHY SENSING;

NANOLITHOGRAPHY; PROBES; SELF ASSEMBLED MONOLAYERS; THREE DIMENSIONAL; UNITS OF MEASUREMENT;

TURNAROUND TIME;

EID: 79957788879     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/22/27/275306     Document Type: Article

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