Block co-polymer multiple patterning directed self-assembly on PS-OH brush layer and AFM based nanolithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 8680, Issue , 2013, Pages

  Oria, Lorea ^a   De Luzuriaga, Alaitz Ruiz ^b   Alduncín, Juan A ^b   Pérez Murano, Francesc ^a  

^a INSTITUTO DE MICROELECTRÓNICA DE BARCELONA   (Spain)

^b Centro de Investigacion Tecnologica En Electroquimica   (Spain)

Author keywords

AFM nanolithography; Block co polymer; Chemical surface modification; Guided self assembly; Multiple patterning; Polymer brush

Indexed keywords

AFM NANOLITHOGRAPHY; CHEMICAL SURFACE MODIFICATION; GUIDED SELF-ASSEMBLY; MULTIPLE PATTERNING; POLYMER BRUSHES;

ATOMIC FORCE MICROSCOPY; BRUSHES; CHEMICAL MODIFICATION; ELECTRON BEAMS; NANOLITHOGRAPHY; SELF ASSEMBLY;

POLYMERS;

EID: 84878406684     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.2014515     Document Type: Conference Paper

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