Mix & match electron beam & scanning probe lithography for high throughput sub-10 nm lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 8680, Issue , 2013, Pages

  Kaestner, Marcus ^a   Hofer, Manuel ^a   Rangelow, Ivo W ^a  

^a ILMENAU UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

Calixarene; Electron beam lithography (EBL); Hybrid lithography; Mix match lithography; Molecular glass resist; Nanolithography; Scanning probe lithography (SPL)

Indexed keywords

CALIXARENES; HYBRID LITHOGRAPHY; LITHOGRAPHIC COMMUNITY; LITHOGRAPHIC RESOLUTION; MOLECULAR GLASS; NEXT GENERATION LITHOGRAPHY; SCANNING PROBE LITHOGRAPHY; SEMICONDUCTOR INDUSTRY;

ELECTRON BEAMS; GLASS; NANOLITHOGRAPHY; PHENOLS; REPAIR; SCANNING PROBE MICROSCOPY; SEMICONDUCTOR DEVICE MANUFACTURE;

ELECTRON BEAM LITHOGRAPHY;

EID: 84878386280     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.2011535     Document Type: Conference Paper

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