Roughness evolution during chemical vapor deposition

Materials Chemistry and Physics

Volumn 112, Issue 2, 2008, Pages 311-318

  Kajikawa, Yuya ^a  

^a UNIVERSITY OF TOKYO   (Japan)

Author keywords

Chemical vapor deposition; Growth mode; Instability; Roughness

Indexed keywords

CONCENTRATION (PROCESS); STAGES; SURFACE ROUGHNESS; TURBULENT FLOW; VAPORS;

CATALYTIC ACTIVITIES; CHEMICAL VAPORS; CONCENTRATION GRADIENT; CONTINUOUS FILMS; CRYSTALLINITY; CRYSTALLOGRAPHIC PLANES; GROWTH MODE; GROWTH STAGES; INITIAL STAGES; INSTABILITY; KINETIC FACTORS; ROUGHNESS; ROUGHNESS EVOLUTION; TWO STAGES; TWO TYPES;

CHEMICAL VAPOR DEPOSITION;

EID: 53349176910     PISSN: 02540584     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matchemphys.2008.06.008     Document Type: Review

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