Surfactant-assisted metallorganic CVD of (111)-oriented copper films with excellent surface smoothness

Electrochemical and Solid-State Letters

Volumn 3, Issue 3, 2000, Pages 138-140

  Hwang, Eui Seong ^a   Lee, Jihwa ^a  

^a Seoul National University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; COPPER; FILM GROWTH; IODINE; METALLORGANIC CHEMICAL VAPOR DEPOSITION; SOLID STATE LASERS; SURFACE ACTIVE AGENTS; SURFACE ROUGHNESS; TEMPERATURE; THICKNESS MEASUREMENT;

ROOT MEAN SQUARE ROUGHNESS; SURFACE SMOOTHNESS;

THICK FILMS;

EID: 0034159506     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1390981     Document Type: Article

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