Chemical vapor deposition and morphology problems

Thin Solid Films

Volumn 365, Issue 2, 2000, Pages 275-293

  Thiart, J J ^a,b   Hlavacek, V ^a   Viljoen, H J ^a,c  

^a UNIVERSITY AT BUFFALO   (United States)

^b SASOL TECHNOLOGY PTY LTD   (South Africa)

^c UNIVERSITY OF NEBRASKA LINCOLN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; FILM GROWTH; FINITE ELEMENT METHOD; MICROELECTRONIC PROCESSING; MORPHOLOGY; PERTURBATION TECHNIQUES; SURFACE TENSION; THIN FILMS;

LINEAR STABILITY ANALYSIS;

SEMICONDUCTING FILMS;

EID: 0033741136     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(99)01053-6     Document Type: Article

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