Enhanced self-diffusion on Cu(111) by trace amounts of S: Chemical-reaction-limited kinetics

Physical Review Letters

Volumn 93, Issue 16, 2004, Pages

  Ling, W L ^a   Bartelt, N C ^a   Pohl, K ^a,b   De La Figuera, J ^a,c   Hwang, R Q ^a,d   McCarty, K F ^a  

^a SANDIA NATIONAL LABORATORIES   (United States)

^b UNIVERSITY OF NEW HAMPSHIRE   (United States)

^c UNIVERSIDAD AUTÓNOMA DE MADRID   (Spain)

^d BROOKHAVEN NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFUSION; ELECTRON MICROSCOPY; MATHEMATICAL MODELS; REACTION KINETICS; SCANNING TUNNELING MICROSCOPY; SINTERING; THERMAL EFFECTS;

DECAY RATE; LOW-ENERGY ELECTRON MICROSCOPY (LEEM); MATERIALS PROCESSING; THIN-FILM GROWTH;

COPPER;

EID: 11344281665     PISSN: 00319007     EISSN: None     Source Type: Journal    
DOI: 10.1103/PhysRevLett.93.166101     Document Type: Article

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