Dynamics of rough interfaces in chemical vapor deposition: Experiments and a model for silica films

Physical Review Letters

Volumn 84, Issue 14, 2000, Pages 3125-3128

  Ojeda, Fernando ^a   Cuerno, Rodolfo ^b   Salvarezza, Roberto ^c   Vázquez, Luis ^a  

^a INSTITUTO DE CIENCIA DE MATERIALES DE MADRID   (Spain)

^b UNIVERSIDAD CARLOS III DE MADRID   (Spain)

^c INSTITUTO DE INVESTIGACIONES FISICOQUÍMICAS TEÓRICAS Y APLICADAS INIFTA   (Argentina)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000651734     PISSN: 00319007     EISSN: 10797114     Source Type: Journal    
DOI: 10.1103/PhysRevLett.84.3125     Document Type: Article

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