Surface roughening in low-pressure chemical vapor deposition

Physical Review B - Condensed Matter and Materials Physics

Volumn 64, Issue 12, 2001, Pages

  Drotar, Jason T ^a   Zhao, Y P ^a   Lu, T M ^a   Wang, G C ^a  

^a Rensselaer Polytechnic Institute   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ARTICLE; MATHEMATICAL ANALYSIS; MODEL; PRESSURE; SIMULATION; SURFACE PROPERTY; SYSTEM ANALYSIS; TIME; VAPOR;

EID: 0035883538     PISSN: 10980121     EISSN: 1550235X     Source Type: Journal    
DOI: 10.1103/PhysRevB.64.125411     Document Type: Article

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