Internal microstructure and formation mechanism of surface protrusions in Pb-Ti-Nb-O thin films prepared by MOCVD

Chemical Vapor Deposition

Volumn 7, Issue 6, 2001, Pages 253-259

  Liu, Xue Dong ^a,c   Funakubo, Hiroshi ^b   Noda, Suguru ^a   Komiyama, Hiroshi ^a  

^a UNIVERSITY OF TOKYO   (Japan)

^b TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

^c NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Formation mechanisms; Lead; MOCVD; Modelling; Niobium; Titanium; Two dimensional vector analysis

Indexed keywords

EID: 0009264260     PISSN: 09481907     EISSN: None     Source Type: Journal    
DOI: 10.1002/1521-3862(200111)7:6<253::AID-CVDE253>3.0.CO;2-1     Document Type: Article

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