Influence of deposition temperature on the microstructure of Pb-Ti-Nb-O thin films by metallorganic chemical vapor deposition

Journal of the Electrochemical Society

Volumn 148, Issue 3, 2001, Pages

  Liu, Xue Dong ^a,b   Funakubo, Hiroshi ^a,b   Noda, Suguru ^a,b   Komiyama, Hiroshi ^a,b  

^a UNIVERSITY OF TOKYO   (Japan)

^b Tokyo Institute of Technology ^*  (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000127530     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1349880     Document Type: Article

References (7)

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