Influence of deposition temperature on the microstructure of Pb-Ti-Nb-O thin films by metallorganic chemical vapor deposition

Journal of the Electrochemical Society

Volumn 148, Issue 3, 2001, Pages

  Liu, Xue Dong ^a,b   Funakubo, Hiroshi ^a,b   Noda, Suguru ^a,b   Komiyama, Hiroshi ^a,b  

^a UNIVERSITY OF TOKYO   (Japan)

^b TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000127530     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1349880     Document Type: Article

References (7)

1. R. C. Ibraham, T. Sakai, T. Nishida, T. Horiuchi, T. Shiosaki, and K. Matsushige, Jpn. J. Appl. Phys. Part 1, 35, 4957 (1996).
2. R. C. Ibraham, T. Horiuchi, T. Shiosaki, and K. Matsushige, Jpn. J. Appl. Phys. Part 1, 37, 4539 (1998).
3. T. Iijima, J. Onagawa, and S. Sanada, Integr. Ferroelectr., 20, 129 (1998).
4. T. Matsuzaki and H. Funakubo, J. Appl. Phys., 86, 4559 (1999).
5. X. D. Liu, H. Funakubo, S. Noda, and H. Komiyama, To be published.
6. P. D. Hren, S. H. Rou, H. N. Al-Shareef, M. S. Ameen, O. Auciello, and A. I. Kingon, in Proceedings of the 3rd International Symposium on Integrated Ferroelectrics, Colorado Springs, CO, 1991, C. A. Paz de Arauzo, Editor, pp. 612-625 (1991).
7. I. Kondo, T. Yoneyama, O. Takenaka, and A. Kinbara, J. Vac. Sci. Technol. A, 10, 3456 (1992).