Chemical reaction engineering in the design of CVD reactors

Chemical Engineering Science

Volumn 54, Issue 13-14, 1999, Pages 1941-1957

  Komiyama, Hiroshi ^a   Shimogaki, Yukihiro ^a   Egashira, Yasuyuki ^b  

^a UNIVERSITY OF TOKYO   (Japan)

^b OSAKA UNIVERSITY   (Japan)

Author keywords

Chemical vapor deposition; Kinetic modeling; Reactor design

Indexed keywords

CHEMICAL ENGINEERING; CHEMICAL REACTORS; CHEMICAL VAPOR DEPOSITION; COMPUTATIONAL FLUID DYNAMICS; COMPUTER AIDED ENGINEERING; DIFFUSION; MACHINE DESIGN; MATHEMATICAL MODELS; MOLECULAR STRUCTURE; REACTION KINETICS; SURFACE TREATMENT;

CHEMICAL REACTION ENGINEERING; COMPUTER CHEMISTRY; DEPOSITION RATE PROFILE; MICROCAVITY DEPOSITION METHOD; REACTOR DESIGN; TUBULAR WALL DEPOSITION METHOD;

CHEMICAL REACTIONS;

CHEMICAL REACTION; COMPUTER AIDED DESIGN; DESIGN; REACTOR; VAPOR DEPOSITION;

EID: 0033166104     PISSN: 00092509     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0009-2509(98)00443-6     Document Type: Article

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