Surface roughening during plasma-enhanced chemical-vapor deposition of hydrogenated amorphous silicon on crystal silicon substrates

Physical Review B - Condensed Matter and Materials Physics

Volumn 56, Issue 7, 1997, Pages 4243-4250

  Tanenbaum, D ^a   Laracuente, A ^a   Gallagher, Alan ^a  

^a UNIVERSITY OF COLORADO   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000279072     PISSN: 10980121     EISSN: 1550235X     Source Type: Journal    
DOI: 10.1103/PhysRevB.56.4243     Document Type: Article

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