Cleaning of silicon surfaces for nanotechnology

Materials Science Forum

Volumn 573-574, Issue , 2008, Pages 77-117

  Senftleben, Oliver ^a   Baumgärtner, Hermann ^a   Eisele, Ignaz ^a  

^a BUNDESWEHR UNIVERSITY MUNICH   (Germany)

Author keywords

Carbon; Cleaning; Contamination; CVD; Epitaxy; Hydrogen bake; MBE; Nanotechnology; Oxygen; Silicon; Surface preparation; Thermal desorption

Indexed keywords

CARBON; CHEMICAL VAPOR DEPOSITION; CLEANING; CONTAMINATION; CRYSTAL DEFECTS; EPITAXIAL GROWTH; INERT GASES; MOLECULAR BEAM EPITAXY; NANOTECHNOLOGY; OXYGEN; RAPID THERMAL PROCESSING; SILICON; SILICON CARBIDE; SILICON COMPOUNDS; SURFACE ROUGHNESS; THERMAL DESORPTION; WIDE BAND GAP SEMICONDUCTORS;

CHEMICAL TECHNIQUES; CLEANING PROCEDURES; ELECTRICAL QUALITY; IMPACT ON SURFACES; INERT GAS ATMOSPHERE; SILICON SUBSTRATES; SURFACE PREPARATION; WET CHEMICAL TREATMENT;

CHEMICAL CLEANING;

EID: 45749134267     PISSN: 02555476     EISSN: 16629752     Source Type: Book Series    
DOI: 10.4028/www.scientific.net/msf.573-574.77     Document Type: Article

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