Arsenic redistribution at the interface during oxidation of implanted silicon

Physical Review B - Condensed Matter and Materials Physics

Volumn 58, Issue 16, 1998, Pages 10990-10999

  Iacona, Fabio ^a   Raineri, Vito ^a   La Via, Francesco ^a   Terrasi, Antonio ^b   Rimini, Emanuele ^b  

^a CNR IMETEM   (Italy)

^b UNIVERSITY OF CATANIA   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001073113     PISSN: 10980121     EISSN: 1550235X     Source Type: Journal    
DOI: 10.1103/PhysRevB.58.10990     Document Type: Article

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