Thermal decomposition of an ultrathin si oxide layer around a Si(001)- (2×1) window

Physical Review Letters

Volumn 84, Issue 5, 2000, Pages 1043-1046

  Miyata, Noriyuki ^a   Watanabe, Heiji ^a,b   Ichikawa, Masakazu ^a  

^a NATL INST FOR ADV INTERDISC RES   (Japan)

^b NEC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001562489     PISSN: 00319007     EISSN: 10797114     Source Type: Journal    
DOI: 10.1103/PhysRevLett.84.1043     Document Type: Article

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