Growth model for thin oxides and oxide optimization

Journal of Applied Physics

Volumn 95, Issue 5, 2004, Pages 2827-2831

  Ludsteck, A ^a   Schulze, J ^a   Eisele, I ^a   Dietl, W ^b   Nenyei, Z ^b  

^a BUNDESWEHR UNIVERSITY MUNICH   (Germany)

^b MATTSON THERMAL PRODUCTS GMBH   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; ATMOSPHERIC PRESSURE; CLEANING; DIFFUSION IN GASES; GROWTH (MATERIALS); OPTIMIZATION; OXIDATION; PHASE INTERFACES; RAPID THERMAL ANNEALING; REACTION KINETICS; THERMAL EFFECTS; VELOCITY MEASUREMENT;

IN SITU CLEANING; RAPID THERMAL PROCESSING (RTP);

SILICON COMPOUNDS;

EID: 1642337155     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1644042     Document Type: Article

References (9)

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