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Volumn 470, Issue , 1984, Pages 164-175

UV/Ozone cleaning for organics removal on silicon wafers

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL REACTIONS - PHOTOCHEMICAL REACTIONS;

EID: 0021627149     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.941910     Document Type: Conference Paper
Times cited : (10)

References (7)
  • 1
    • 84987044631 scopus 로고
    • Ultraviolet Depolymerization of Photoresist Polymers
    • Bolon, D.A., and Kunz, C.O., Ultraviolet Depolymerization of Photoresist Polymers, Polymer Engineering and Science, 12. 109-111 (1972).
    • (1972) Polymer Engineering and Science , vol.12 , pp. 109-111
    • Bolon, D.A.1    Kunz, C.O.2
  • 3
    • 0017219891 scopus 로고
    • UV/Ozone Cleaning of Surfaces, IEEE Transactions on parts
    • Vig, J.R., and LeBus, J.W., UV/Ozone Cleaning of Surfaces, IEEE Transactions on parts, Hybrids ana Packaging, PHP-12, 365-370 (1976).
    • (1976) Hybrids Ana Packaging , vol.PHP-12 , pp. 365-370
    • Vig, J.R.1    Lebus, J.W.2
  • 4
    • 0343020289 scopus 로고
    • Surface Cleaning’in’Thin Film’Technology
    • Mattox, D.M., Surface Cleaning’in’Thin Film’Technology, Thin Solid Films, 53 81-96 (1978).
    • (1978) Thin Solid Films , vol.53 , pp. 81-96
    • Mattox, D.M.1
  • 7
    • 0003158110 scopus 로고
    • UV/Ozone Cleaning of Surfaces, to be published in the
    • Plenum Publishing Corporation, New York
    • Vig, J.R., UV/Ozone Cleaning of Surfaces, to be published in the “Treatise on Clean Surface Technology” Plenum Publishing Corporation, New York (1984)
    • (1984) Treatise on Clean Surface Technology
    • Vig, J.R.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.