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Volumn 470, Issue , 1984, Pages 164-175
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UV/Ozone cleaning for organics removal on silicon wafers
a a
a
UVP LLC
(United States)
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Author keywords
[No Author keywords available]
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Indexed keywords
CHEMICAL REACTIONS - PHOTOCHEMICAL REACTIONS;
CHEMISTRY OF CLEANING ENHANCEMENT;
ION-IMPLANTED RESISTS;
PHOTORESIST RESIDUE CLEANING;
SILICON SEMICONDUCTOR WAFERS;
UV LIGHT AND OZONE COMBINATION;
SEMICONDUCTING SILICON;
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EID: 0021627149
PISSN: 0277786X
EISSN: 1996756X
Source Type: Conference Proceeding
DOI: 10.1117/12.941910 Document Type: Conference Paper |
Times cited : (10)
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References (7)
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