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Volumn 80, Issue 9, 1996, Pages 5408-5414

Oxidation mechanism of the ammonium-fluoride-treated Si(100) surface

Author keywords

[No Author keywords available]

Indexed keywords


EID: 0001388177     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.362727     Document Type: Article
Times cited : (38)

References (25)
  • 16
    • 85033859768 scopus 로고    scopus 로고
    • note
    • -1, as has been reported in previous IR studies (Ref. 3) and observed in our laboratory using HREELS for in situ prepared samples.
  • 18
    • 85033842665 scopus 로고    scopus 로고
    • note
    • The spectra for air exposures of 48 days and longer are multiplied by two because the count rates on these surfaces were dramatically reduced compared to the short exposure ssamples. The lower count rates are indicative of a more disordered surface, as would be expected with increased oxidation.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.