Low energy electron stimulated etching of thin Si-oxide layer in nanometer scale using scanning tunneling microscope

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 38, Issue 3 A, 1999, Pages

  Li, Nan ^a   Yoshinobu, Tatsuo ^a   Iwasaki, Hiroshi ^a  

^a OSAKA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DESORPTION; ELECTRON BEAMS; ETCHING; NANOTECHNOLOGY; SCANNING TUNNELING MICROSCOPY; SEMICONDUCTING SILICON COMPOUNDS; THIN FILMS;

THERMAL DESORPTION;

SEMICONDUCTING FILMS;

EID: 0032675877     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.38.l252     Document Type: Article

References (13)