Properties of ultrathin films appropriate for optics capping layers exposed to high energy photon irradiation

Surface Science Reports

Volumn 63, Issue 2, 2008, Pages 73-99

  Bajt, Saša ^a   Edwards, N V ^b   Madey, Theodore E ^c  

^a LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

^b FREESCALE SEMICONDUCTOR INC   (United States)

^c RUTGERS UNIVERSITY   (United States)

Author keywords

Capping layer; Carbonization; Extreme ultraviolet; Extreme ultraviolet lithography; Multilayer; Optics contamination; Oxidation; Protective film; Rhodium; Ruthenium; TiO2; ZrO2

Indexed keywords

CARBONIZATION; CONTAMINATION; EXTREME ULTRAVIOLET LITHOGRAPHY; IRRADIATION; OPTICS; OXIDATION; PHOTONS; PROTECTIVE COATINGS; RHODIUM; RUTHENIUM; SYNCHROTRON RADIATION; TITANIUM DIOXIDE; VACUUM GAGES; ZIRCONIA;

CAPPING LAYERS; OPTICS CONTAMINATION; PHOTON IRRADIATION;

ULTRATHIN FILMS;

EID: 38349073323     PISSN: 01675729     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfrep.2007.09.001     Document Type: Review

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