Oxidation and reduction of ultrathin nanocrystalline Ru films on silicon: Model system for Ru-capped extreme ultraviolet lithography optics

Journal of Physical Chemistry C

Volumn 111, Issue 29, 2007, Pages 10988-10992

  He, Y B ^a,c   Goriachko, A ^a   Korte, C ^a   Farkas, A ^a   Mellau, G ^a   Dudin, P ^b   Gregoratti, L ^b   Barinov, A ^b   Kiskinova, M ^b   Stierle, A ^c   Kasper, N ^c   Bajt, S ^d   Over, H ^a  

^a JUSTUS LIEBIG UNIVERSITY   (Germany)

^b SINCROTRONE TRIESTE   (Italy)

^c MAX PLANCK INSTITUTE FOR INTELLIGENT SYSTEMS   (Germany)

^d LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON GROWTH; ULTRAVIOLET LITHOGRAPHY;

NANOCRYSTALLINE MATERIALS; OXIDATION; RUTHENIUM; SCANNING ELECTRON MICROSCOPY; SINGLE CRYSTAL SURFACES; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

ULTRATHIN FILMS;

EID: 34547688848     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp071339b     Document Type: Article

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