Temperature induced diffusion in Mo/Si multilayer mirrors

Journal of Applied Physics

Volumn 83, Issue 9, 1998, Pages 4700-4708

  Voorma, H J ^a,b   Louis, E ^a   Koster, N B ^a   Bijkerk, F ^a  

^a FOM INSTITUTE FOR PLASMA PHYSICS RIJNHUIZEN   (Netherlands)

^b ASML   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000690424     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.367258     Document Type: Article

References (36)

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