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Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 41, Issue 6 B, 2002, Pages 4074-4081

Mo/Si multilayers with different barrier layers for applications as extreme ultraviolet mirrors

(5) Braun, Stefan a,b Mai, Hermann a Moss, Matthew a Scholz, Roland a Leson, Andreas a

a FRAUNHOFER INSTITUTE FOR MATERIAL AND BEAM TECHNOLOGY IWS (Germany)

b MAX PLANCK INSTITUTE OF MICROSTRUCTURE PHYSICS (Germany)

Author keywords

B4C; Barrier layers; C; EUV; Magnetron sputter deposition; Mirror; Mo Si; Multilayer; Optics; PLD

Indexed keywords

INTERFACES (MATERIALS); LIGHT REFLECTION; MAGNETRON SPUTTERING; MOLYBDENUM; MULTILAYERS; PULSED LASER DEPOSITION; SILICON; SPUTTER DEPOSITION; TRANSMISSION ELECTRON MICROSCOPY; ULTRAVIOLET DEVICES;

ULTRAVIOLET MIRRORS;

MIRRORS;

EID: 0036614411 PISSN: 00214922 EISSN: None Source Type: Journal
DOI: 10.1143/jjap.41.4074 Document Type: Article

Times cited : (152)

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