Experimental investigation of beryllium-based multilayer coatings for extreme ultraviolet lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3767, Issue , 1999, Pages 259-270

  Bajt, Sasa ^a   Behymer, Ricke D ^a   Mirkarimi, Paul B ^a   Montcalm, Claude ^a   Wall, Mark A ^a   Wedowski, Marco ^a   Folta, James A ^a  

^a LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BERYLLIUM; CRYSTAL MICROSTRUCTURE; LIGHT REFLECTION; MOLYBDENUM; MOLYBDENUM COMPOUNDS; OPTICAL COATINGS; OPTICAL MULTILAYERS; PHOTOLITHOGRAPHY; RUTHENIUM; STRESSES; THERMODYNAMIC STABILITY; ULTRAVIOLET RADIATION;

EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY; MULTILAYER COATINGS;

REFLECTIVE COATINGS;

EID: 0033361671     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (19)