The effects of radiation induced carbon contamination on the performance of an EUV lithographic optic

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5037 I, Issue , 2003, Pages 450-459

  Barty, Anton ^a   Goldberg, Kenneth A ^b  

^a LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

^b LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ABERRATIONS; FOCUSING; MASKS; OPTICAL DEVICES; SYSTEMS ANALYSIS; ULTRAVIOLET RADIATION;

CARBON CONTAMINATION; DEMAGNIFICATION; EXTREME ULTRAVIOLET LITHOGRAPHY;

LITHOGRAPHY;

EID: 0141501335     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.499372     Document Type: Conference Paper

References (0)