Stress, reflectance, and temporal stability of sputter-deposited Mo/Si and Mo/Be multilayer films for extreme ultraviolet lithography

Optical Engineering

Volumn 38, Issue 7, 1999, Pages 1246-1259

  Mirkarimi, Paul B ^a  

^a LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

LIGHT REFLECTION; MOLYBDENUM COMPOUNDS; MULTILAYERS; PHOTOLITHOGRAPHY; SPUTTER DEPOSITION; STRESS ANALYSIS;

EXTREME ULTRAVIOLET LITHOGRAPHY;

OPTICAL FILMS;

EID: 0032665978     PISSN: 00913286     EISSN: None     Source Type: Journal    
DOI: 10.1117/1.602170     Document Type: Article

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