Surface phenomena related to mirror degradation in extreme ultraviolet (EUV) lithography

Applied Surface Science

Volumn 253, Issue 4, 2006, Pages 1691-1708

  Madey, Theodore E ^a   Faradzhev, Nadir S ^a   Yakshinskiy, Boris V ^a   Edwards, N V ^b  

^a State University of New Jersey   (United States)

^b SEMATECH   (United States)

Author keywords

Electron stimulated desorption; EUV optics contamination; EUV optics lifetime; Extreme ultraviolet lithography; Oxygen; Photon stimulated desorption; Ru(0 0 0 1); Ru(1 0 over(1, ) 0); Ruthenium; Water

Indexed keywords

LIGHTING; LITHOGRAPHY; MIRRORS; OXYGEN; REDOX REACTIONS; RUTHENIUM; SURFACE CHEMISTRY; ULTRAVIOLET RADIATION;

ANTIDOTES; CAPPING LAYERS; OPTICS CONTAMINATION; ULTRAVIOLET (EUV) LITHOGRAPHY;

SURFACE PHENOMENA;

EID: 33745606362     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2006.04.065     Document Type: Review

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