Design and performance of capping layers for EUV multilayer mirrors

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5037 I, Issue , 2003, Pages 236-248

  Bajt, Saša ^a   Chapman, Henry N ^a   Nguyen, Nhan ^a   Alameda, Jennifer ^a   Robinson, Jeffrey C ^a   Malinowski, Michael ^b   Gullikson, Eric ^c   Aquila, Andy ^c   Tarrio, Charles ^d   Grantham, Steven ^d  

^a LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

^b SANDIA NATIONAL LABORATORIES   (United States)

^c LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^d NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

Capping layer; Extreme ultraviolet (EUV) lithography; Multilayers; Optics; Oxidation resistance; Reflectivity; Ruthenium

Indexed keywords

ELECTRON BEAMS; MIRRORS; MULTILAYERS; OPTICS; OXIDATION RESISTANCE; PROTECTIVE COATINGS; REFLECTION; RUTHENIUM;

EXTREME ULTRAVIOLET LITHOGRAPHY; PROTECTIVE CAPPING LAYER COATINGS;

LITHOGRAPHY;

EID: 0141724793     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.484966     Document Type: Conference Paper

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