Advances in multilayer reflective coatings for extreme-ultraviolet lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3676, Issue II, 1999, Pages 702-709

  Folta, James A ^a   Bajt, Sasa ^a   Barbee Jr , Troy W ^a   Grabner, Robert F ^a   Mirkarimi, Paul B ^a   Nguyen, Tai ^a   Schmidt, Mark A ^a   Spiller, Eberhard ^a   Walton, Christopher C ^a   Wedowski, Marco ^a   Montcalm, Claude ^a  

^a LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; LIGHT REFLECTION; MIRRORS; MULTILAYERS; REFLECTIVE COATINGS; ULTRAVIOLET RADIATION;

EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY;

PHOTOLITHOGRAPHY;

EID: 0032624672     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.351156     Document Type: Conference Paper

References (11)