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Volumn 61-62, Issue , 2002, Pages 65-76

Molecular contamination mitigation in EUVL by environmental control

(15) Koster, Norbert a Mertens, Bas a Jansen, Rik a Van De Runstraat, Annemieke a Stietz, Frank b Wedowski, Marco b Meiling, Hans c Klein, Roman d Gottwald, Alexander d Scholze, Frank d Visser, Matthieu e Kurt, Ralph e Zalm, Peer e Louis, Eric f Yakshin, Andrey f

a TNO (Netherlands)

b CARL ZEISS SMT AG (Germany)

c ASML (Netherlands)

d PHYSIKALISCH TECHNISCHE BUNDESANSTALT (Germany)

e PHILIPS RESEARCH LABORATORIES (Netherlands)

f FOM INSTITUTE FOR PLASMA PHYSICS RIJNHUIZEN (Netherlands)

Author keywords

Carbon growth; Contamination; EUVL; Mirror lifetime; MoSi mirrors; Oxidation; Reflection loss

Indexed keywords

ABSORPTION; CONTAMINATION; ELECTRON GUNS; ENVIRONMENTAL IMPACT; HYDROCARBONS; MIRRORS; MOLYBDENUM COMPOUNDS; MULTILAYERS; OXIDATION; OXYGEN; REFLECTION; SEMICONDUCTOR MATERIALS; SYNCHROTRON RADIATION;

MOLECULAR CONTAMINATION MITIGATION;

MICROELECTRONICS;

EID: 0036643631 PISSN: 01679317 EISSN: None Source Type: Journal
DOI: 10.1016/S0167-9317(02)00535-X Document Type: Conference Paper

Times cited : (40)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.