Atomic hydrogen cleaning of Ru-capped EUV multilayer mirror

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6517, Issue PART 1, 2007, Pages

  Motai, Kumi ^a   Oizumi, Hiroaki ^a,b   Miyagaki, Shinji ^a   Nishiyama, I ^a   Izumi, Akira ^b   Ueno, Tomoya ^b   Miyazaki, Yasuo ^b   Namiki, Akira ^b  

^a ASSOCIATION OF SUPER ADVANCED ELECTRONICS TECHNOLOGIES ASET   (Japan)

^b KYUSHU INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Atomic hydrogen cleaning; EUV lithography; Ru capped multilayer mirror; Surface oxide; Transport

Indexed keywords

CLEANING; HYDROGEN; MULTILAYERS; OXIDATION; REFLECTION; RUTHENIUM;

ATOMIC HYDROGEN CLEANING; MULTILAYER MIRRORS; SURFACE OXIDES;

EXTREME ULTRAVIOLET LITHOGRAPHY;

EID: 35148814926     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.711998     Document Type: Conference Paper

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