Ultrahigh x-ray reflectivity from W/Al 2O 3 multilayers fabricated using atomic layer deposition

Applied Physics Letters

Volumn 88, Issue 1, 2006, Pages

  Fabreguette, Francois H ^a   Wind, Rikard A ^a   George, Steven M ^a,b  

^a UNIVERSITY OF COLORADO   (United States)

^b UCB 450   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC LAYER DEPOSITION; CONFORMAL DEPOSITION; ULTRAHIGH X-RAY REFLECTIVITY;

DEPOSITION; FILM GROWTH; INTERFACES (MATERIALS); REFLECTION; SURFACE CHEMISTRY; X RAYS;

MULTILAYERS;

EID: 33645507042     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2161117     Document Type: Article

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