Heat stability of Mo/Si multilayers inserted with compound layers

Surface and Coatings Technology

Volumn 169-170, Issue , 2003, Pages 628-631

  Ishino, M ^a   Yoda, O ^a   Takenaka, H ^b   Sano, K ^c   Koike, M ^a  

^a JAPAN ATOMIC ENERGY AGENCY   (Japan)

^b NTT Advance Technology Corporation   (Japan)

^c Shimadzu Scientific Research Inc   (Japan)

Author keywords

Molybdenum; Multilayer; Silicon; Silicon oxide; Sputtering; X Ray diffraction

Indexed keywords

ANNEALING; SILICA; THERMODYNAMIC STABILITY; VACUUM FURNACES; X RAYS;

ION BEAM SPUTTERING;

MULTILAYERS;

COATING; HEAT CAPACITY; SPUTTERING; SURFACE TREATMENT;

EID: 19244385159     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(03)00074-4     Document Type: Article

References (10)

1. Yanagihara M. Mayama K. Goto Y. Kusunoki I. Asaoka S. Maezawa H. Nucl. Instrum. Methods A 334 1993 638
2. Jiang Z. Jiang X. Liu W. Wu Z. J. Appl. Phys. 65 1989 196
3. Takenaka H. Kawamura T. Ishii Y. Asagiri S. J. Appl. Phys. 78 1995 5227
4. Azuma H. Takeichi A. Konomi I. Watanabe Y. Noda S. Jpn. J. Appl. Phys. 32 1993 2078
5. Stock H.J. Kleineberg U. Kloidt A. et al. Appl. Phys. Lett. 63 1993 2207
6. Takenaka H. Ito H. Haga T. Kawamura T. J. Synchrotron Radiat. 5 1998 708
7. Bevolo A.J. Campisi G.J. Schanks H.R. Schmidt F.A. J. Appl. Phys. 51 1980 5390
8. Ulyanenkov A. Matsuo R. Omote K. et al. J. Appl. Phys. 87 2000 7255
9. Koike M. Sano K. Yoda O. et al. Rev. Sci. Instrum. 73 2002 1541
10. Rosen R.S. Stearns D.G. Kassner M.E. Koike J.I. Cheng Y. Vernon S.P. Nanostruct. Mater. 3 1993 195