Reflectance measurements on clean surfaces for the determination of optical constants of silicon in the extreme ultraviolet-soft-x-ray region

Applied Optics

Volumn 36, Issue 22, 1997, Pages 5499-5507

  Soufli, Regina ^a,b   Gullikson, Eric M ^b  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001380394     PISSN: 1559128X     EISSN: 21553165     Source Type: Journal    
DOI: 10.1364/AO.36.005499     Document Type: Article

References (15)

1. B. L. Henke, E. M. Gullikson, and J. C. Davis, At. Data Nucl. Data Tables 54 (1993).
2. D. L. Windt, W. C. Cash, Jr., M. Scott, P. Arendt, B. Newnam, R. Fisher, A. B. Swartzlander, P. Z. Takacs, and J. M. Pinneo, “Optical constants for thin films of C, diamond, Al, Si, and CVD SiC from 24 A to 1216 A, ” Appl. Opt. 27, 279-295 (1988).
3. F. R. Bartsch, H. G. Birken, C. Kunz, and R. Wolf, “Reflectance and total photoelectric yield measurements of silicon wafers in the XUV spectral range, ” Semicond. Sci. Technol. 5, 974-979 (1990).
4. 2 3 edges, ” Phys. Rev. B 49, 16283-16288 (1994).
5. D. Y. Smith, “X-ray optical properties: a review of the constraints and the data base, ” in X-Ray and Vacuum Ultraviolet Interaction Data Bases, Calculations, and Measurements, N. K. Del Grande, P. Lee, J. A. Samson, and D. Y. Smith, eds., Proc. SPIE 911, 86-99 (1988).
6. R. W. C. Hansen, J. Wolske, D. Wallace, and M. Bissen, “Cleaning of optical surfaces with photogenerated reactants, ” Nucl. Instrum. Methods A 347, 249-253 (1994).
7. J. M. C. Thornton and R. H. Williams, “S/XPS Study of hydrogen terminated, ordered silicon (100) and (111) surfaces prepared by chemical etching, ” Phys. Scr. 41, 1047-1052 (1990).
8. T. Takahagi, I. Nagai, A. Ishitani, and H. Kuroda, “Formation of hydrogen passivated silicon single-crystal surfaces using ultraviolet cleaning and HF etching, ” J. Appl. Phys. 64, 3516-3521 (1988).
9. A. F. Carley and M. W. Roberts, “X-ray photoelectron spectroscopic study of the interaction of oxygen and nitric oxide with aluminum, ” Proc. R. Soc. London Ser. A 363, 403-424 (1978).
10. E. M. Gullikson, J. H. Underwood, P. J. Batson, and V. Nikitin, “Soft x-ray/EUV reflectometer based on a laser produced plasma source, ” J. X-Ray Sci. Technol. 3, 283-299 (1992).
11. J. H. Underwood, E. M. Gullikson, M. Koike, P. J. Batson, P. E. Denham, K. D. Franck, R. E. Tackaberry, and W. F. Steele, “Calibration and standards beamline 6.3.2 at the advanced light source, ” in Conference on Synchrotron Radiation Instrumentation’95, in Rev. Sci. Instrum. 67 (1996), available only on CD-ROM.
12. M. Lampton, B. Margon, and S. Bowyer, “Parameter estimation in x-ray astronomy, ” Astrophys. J. 208, 177-190 (1976).
13. W. R. Hunter, “Measurement of optical properties of materials in the vacuum ultraviolet spectral region, ” Appl. Opt. 21, 2103-2114 (1982).
14. IIIII edge of silicon and aluminum, ” Phys. Rev. B 2, 1918-1925 (1970).
15. G. Doolen and D. A. Liberman, “Calculations of photoabsorption by atoms using a linear response method, ” Phys. Scr. 36, 77-79 (1987).