메뉴 건너뛰기




Volumn 41, Issue 34, 2002, Pages 7309-7316

Measurements of the refractive index of yttrium in the 50–1300-eV energy region

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROMAGNETIC DISPERSION; ENERGY ABSORPTION; LIGHT SOURCES; METALLIC FILMS; MIRRORS; MULTILAYERS; REFRACTIVE INDEX; ULTRAVIOLET RADIATION; X RAYS;

EID: 0036902092     PISSN: 1559128X     EISSN: 21553165     Source Type: Journal    
DOI: 10.1364/AO.41.007309     Document Type: Article
Times cited : (40)

References (18)
  • 1
    • 85010134155 scopus 로고    scopus 로고
    • Information about the Extreme Ultraviolet Explorer mission and the observed spectral lines can be obtained at
    • Information about the Extreme Ultraviolet Explorer mission and the observed spectral lines can be obtained at http:// ssl.berkeley.edu/euve.
  • 2
    • 85010134162 scopus 로고    scopus 로고
    • The experimental Multilayer Survey is available at
    • The experimental Multilayer Survey is available at http://www.cxro.lbl.gov/multilayer/survey.html.
  • 3
    • 0001172847 scopus 로고    scopus 로고
    • Molybdenum-strontium multilayer mirrors for the 8-12-nm extreme ultraviolet wavelength region
    • B. Sae-Lao and C. Montcalm, “Molybdenum-strontium multilayer mirrors for the 8-12-nm extreme ultraviolet wavelength region,” Opt. Lett. 26, 468-470 (2001).
    • (2001) Opt. Lett. , vol.26 , pp. 468-470
    • Sae-Lao, B.1    Montcalm, C.2
  • 5
    • 0036575170 scopus 로고    scopus 로고
    • Performance of normal-incidence molybdenum-yttrium multilayer-coated grating at a wavelength of 9 nm
    • B. Sae-Lao, S. Bajt, C. Montcalm, and J. F. Seely, “Performance of normal-incidence molybdenum-yttrium multilayer-coated grating at a wavelength of 9 nm,” Appl. Opt. 41, 2394-2400 (2002).
    • (2002) Appl. Opt. , vol.41 , pp. 2394-2400
    • Sae-Lao, B.1    Bajt, S.2    Montcalm, C.3    Seely, J.F.4
  • 6
    • 0004932883 scopus 로고
    • X-ray interactions: Photoabsorption, scattering, transmission, and reflection at E = 50-30,000 eV, Z = 1-92
    • Data Tables 54, an updated version of these data is available at
    • B. L. Henke, E. M. Gullikson, and J. C. Davis, “X-ray interactions: photoabsorption, scattering, transmission, and reflection at E = 50-30,000 eV, Z = 1-92,” At. Data Nucl. Data Tables 54, 181-342 (1993); an updated version of these data is available at http://www-cxro.lbl.gov.
    • (1993) At. Data Nucl. , pp. 181-342
    • Henke, B.L.1    Gullikson, E.M.2    Davis, J.C.3
  • 8
    • 0016512261 scopus 로고
    • Optical constants from the far infrared to the X-ray region: Mg, Al, Cu, Ag, Au, Bi, C, and A12O3
    • H. J. Hagemann, W. Gudat, and C. Kunz, “Optical constants from the far infrared to the X-ray region: Mg, Al, Cu, Ag, Au, Bi, C, and A12O3,” J. Opt. Soc. Am. 65, 742-744 (1975).
    • (1975) J. Opt. Soc. Am. , vol.65 , pp. 742-744
    • Hagemann, H.J.1    Gudat, W.2    Kunz, C.3
  • 10
    • 0001593228 scopus 로고    scopus 로고
    • Absolute photoabsorption mea-surements of molybdenum in the range 60-930 eV for optical constant determination
    • R. Soufli and E. M. Gullikson, “Absolute photoabsorption mea-surements of molybdenum in the range 60-930 eV for optical constant determination,” Appl. Opt. 37, 1713-1719 (1998).
    • (1998) Appl. Opt. , vol.37 , pp. 1713-1719
    • Soufli, R.1    Gullikson, E.M.2
  • 11
    • 0001726778 scopus 로고
    • Finite-energy f-sum rules for valence electrons
    • D. Y. Smith and E. Shiles, “Finite-energy f-sum rules for valence electrons,” Phys. Rev. B. 17, 4689-4694 (1978).
    • (1978) Phys. Rev. B. , vol.17 , pp. 4689-4694
    • Smith, D.Y.1    Shiles, E.2
  • 12
    • 84957474491 scopus 로고
    • X-ray optical properties: A review of the constraints and the data base
    • N. K. Del Grande, P. Lee, J. A. Samson, and D. Y. Smith, eds., Proc. SPIE
    • D. Y. Smith, “X-ray optical properties: A review of the constraints and the data base,” in X-ray and VUV Interaction Data Bases, Calculations, and Measurements, N. K. Del Grande, P. Lee, J. A. Samson, and D. Y. Smith, eds., Proc. SPIE 911, 86-99 (1988).
    • (1988) X-Ray and VUV Interaction Data Bases, Calculations, and Measurements , vol.911 , pp. 86-99
    • Smith, D.Y.1
  • 13
    • 5544251531 scopus 로고
    • 2nd ed. (Addison-Wesley, Readrog, Mass., Chap
    • E. Hecht, Optics, 2nd ed. (Addison-Wesley, Readrog, Mass., 1989), Chap. 4.
    • (1989) Optics , pp. 4
    • Hecht, E.1
  • 14
    • 85010126606 scopus 로고    scopus 로고
    • technical paper available at
    • M. T. Wilson, technical paper available at http://www.pure-techinc.com/tech_papers/tech_papers.htm.
    • Wilson, M.T.1
  • 15
    • 0034768310 scopus 로고    scopus 로고
    • Filter windows for EUV lithography
    • V. E. A. Dobisz, eds., Proc. SPIE
    • F. R. Powell and T. A. Johnson, “Filter windows for EUV lithography,” in Emerging Lithographic Technologies V. E. A. Dobisz, eds., Proc. SPIE 4343, 585-589 (2001).
    • (2001) Emerging Lithographic Technologies , vol.4343 , pp. 585-589
    • Powell, F.R.1    Johnson, T.A.2
  • 16
    • 0000022036 scopus 로고    scopus 로고
    • High-resolution, high-flux, user friendly VLS beamline at the ALS for the 50-1300 eV energy region
    • J. H. Underwood and E. M. Gullikson, “High-resolution, high-flux, user friendly VLS beamline at the ALS for the 50-1300 eV energy region,” J. Electron Spectrosc. Relat. Phenom. 92, 265-272 (1998).
    • (1998) J. Electron Spectrosc. Relat. Phenom. , vol.92 , pp. 265-272
    • Underwood, J.H.1    Gullikson, E.M.2
  • 17
    • 0034768492 scopus 로고    scopus 로고
    • Recent developments in EUV reflectometry at the Advanced Light Source
    • E. A. Dobisz, ed., Proc. SPIE
    • E. M. Gullikson, S. Mrowka, and B. B. Kaufmann, “Recent developments in EUV reflectometry at the Advanced Light Source,” in Emerging Lithographic Technologies V, E. A. Dobisz, ed., Proc. SPIE 4343, 363-373 (2001).
    • (2001) Emerging Lithographic Technologies V , vol.4343 , pp. 363-373
    • Gullikson, E.M.1    Mrowka, S.2    Kaufmann, B.B.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.