Mo/Si and Mo/Be multilayer thin films on zerodur substrates for extreme-ultraviolet lithography

Applied Optics

Volumn 39, Issue 10, 2000, Pages 1617-1625

  Mirkarimi, Paul B ^a   Bajt, Sasa ^a   Wall, Mark A ^a  

^a LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BANDWIDTH; MULTILAYERS; SINGLE CRYSTALS; SUBSTRATES; THIN FILMS;

ZERODUR SUBSTRATES;

LITHOGRAPHY;

EID: 0001662271     PISSN: 1559128X     EISSN: 21553165     Source Type: Journal    
DOI: 10.1364/AO.39.001617     Document Type: Article

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