Oxidation resistance and microstructure of ruthenium-capped extreme ultraviolet lithography multilayers

Journal of Microlithography, Microfabrication and Microsystems

Volumn 5, Issue 2, 2006, Pages

  Bajt, Saša ^a   Dai, Zu Rong ^a   Nelson, Erik J ^a   Wall, Mark A ^a   Alameda, Jennifer B ^a   Nguyen, Nhan Q ^a   Baker, Sherry L ^a   Robinson, Jeffrey C ^a   Taylor, John S ^a   Aquila, Andrew ^b   Edwards, Nora Virginia ^c  

^a LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

^b LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^c SEMATECH   (United States)

Author keywords

Capping layer; Extreme ultraviolet lithography; Microstructure; Molybdenum silicon; Multilayer; Oxidation; Ruthenium; Thermal stability

Indexed keywords

CAPPING LAYER; EXTREME ULTRAVIOLET LITHOGRAPHY; MOLYBDENUM/SILICON;

DEPOSITION; MICROSTRUCTURE; OXIDATION RESISTANCE; PHOTOLITHOGRAPHY; RUTHENIUM; THERMODYNAMIC STABILITY; TRANSMISSION ELECTRON MICROSCOPY; ULTRAVIOLET RADIATION;

MULTILAYERS;

EID: 33748558106     PISSN: 15371646     EISSN: None     Source Type: Journal    
DOI: 10.1117/1.2201027     Document Type: Article

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