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Optical Engineering

Volumn 41, Issue 8, 2002, Pages 1797-1804

Improved reflectance and stability of Mo-Si multilayers

(7) Bajt, Saša a Alameda, Jennifer B a Barbee Jr , Troy W a Cliff, W Miles a Folta, James A a Kaufmann, Ben a Spiller, Eberhard A a

a LAWRENCE LIVERMORE NATIONAL LABORATORY (United States)

Author keywords

Capping layers; Extreme ultraviolet (EUV) lithography; Interfaces; Multilayers; Oxidation resistance; Reflectance

Indexed keywords

INTERFACES (MATERIALS); LITHOGRAPHY; MOLYBDENUM; OXIDATION RESISTANCE; SILICON;

EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY;

MULTILAYERS;

EID: 0036671788 PISSN: 00913286 EISSN: None Source Type: Journal
DOI: 10.1117/1.1489426 Document Type: Article

Times cited : (231)

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