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Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4688, Issue 1, 2002, Pages 442-453

Controlling contamination in Mo/Si multilayer mirrors by Si surface-capping modifications

(6) Malinowski, M a Steinhaus, C a Clift, M a Klebanoff, L E a Mrowka, S b Soufli, R c

a SANDIA NATIONAL LABORATORIES (United States)

b LAWRENCE BERKELEY NATIONAL LABORATORY (United States)

c LAWRENCE LIVERMORE NATIONAL LABORATORY (United States)

Author keywords

Carbon deposition; ETS; Extreme ultraviolet; Multilayer mirror; Photoelectrons

Indexed keywords

CARBONIZATION; CONTAMINATION; ELECTRIC FIELD EFFECTS; LIGHT REFLECTION; LIGHT SOURCES; MOLYBDENUM; OPTICAL MULTILAYERS; SILICON WAFERS; SYNCHROTRONS; ULTRAVIOLET RADIATION;

MULTILAYER MIRRORS; PHOTOELECTRONS;

MIRRORS;

EID: 0036378655 PISSN: 0277786X EISSN: None Source Type: Journal
DOI: 10.1117/12.472320 Document Type: Article

Times cited : (30)

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