Thermal stability of Mo/Si multilayers with boron carbide interlayers

Thin Solid Films

Volumn 444, Issue 1-2, 2003, Pages 165-173

  Böttger, Thomas ^a,b   Meyer, Dirk C ^a   Paufler, Peter ^a   Braun, Stefan ^b   Moss, Matthew ^b   Mai, Hermann ^b   Beyer, Eckhard ^b  

^a DRESDEN UNIVERSITY OF TECHNOLOGY   (Germany)

^b FRAUNHOFER INSTITUTE FOR MATERIAL AND BEAM TECHNOLOGY IWS   (Germany)

Author keywords

Boron Carbide; Diffusion; Multilayers; Silicides

Indexed keywords

BORON CARBIDE; MOLYBDENUM; SILICON; THERMODYNAMIC STABILITY; TRANSMISSION ELECTRON MICROSCOPY;

INTERLAYERS;

MULTILAYERS;

EID: 17144437734     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(03)01028-9     Document Type: Article

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