Carbon accumulation and mitigation processes, and secondary electron yields of ruthenium surfaces

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6517, Issue PART 2, 2007, Pages

  Yakshinskiy, B V ^a   Wasielewski, R ^a,b   Loginova, E ^a   Madey, Theodore E ^a  

^a State University of New Jersey   (United States)

^b UNIVERSITY OF WROC AW   (Poland)

Author keywords

Electron induced reactions; EUV optics contamination; EUV optics lifetime; Extreme ultraviolet lithography (EUVL); Methyl methacrylate (MMA); Mitigation; Ru(0001); Ru(101 0); Ruthenium; Secondary electron yield (SEY); Water

Indexed keywords

ELECTRON INDUCED REACTIONS; EUV OPTICS CONTAMINATION; EUV OPTICS LIFETIME; METHYL METHACRYLATE (MMA); SECONDARY ELECTRON YIELD (SEY);

EXTREME ULTRAVIOLET LITHOGRAPHY; MIRRORS; RUTHENIUM; SURFACE CHEMISTRY; SYNCHROTRON RADIATION; WATER;

MULTILAYERS;

EID: 35148886721     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.711785     Document Type: Conference Paper

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