Effect of process parameters on pattern edge roughness of chemically-amplified resists

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3999, Issue , 2000, Pages

  Koh, Hui Peng ^a   Lin, Qun Ying ^a   Hu, Xiao ^a   Chan, Lap ^a  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

SOLUBILITY; SURFACE ROUGHNESS;

CHEMICALLY AMPLIFIED RESISTS;

PHOTORESISTS;

EID: 0033718111     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (17)