Aerial image contrast using interferometric lithography: Effect on line-edge roughness

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3678, Issue I, 1999, Pages 160-171

  Sanchez, Martha I ^a   Hinsberg, William D ^a   Houle, Frances A ^a   Hoffnagle, John A ^a   Ito, Hiroshi ^a   Nguyen, Cattien ^a  

^a IBM ALMADEN RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

INTERFEROMETRY; OPTICAL RESOLVING POWER; SURFACE ROUGHNESS;

AERIAL IMAGE CONTRAST; INTERFEROMETRIC LITHOGRAPHY; LINE EDGE ROUGHNESS (LER);

PHOTORESISTS;

EID: 0032625410     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.350198     Document Type: Conference Paper

References (14)