Characterization of line edge roughness in photoresist using an image fading technique

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5376, Issue PART 1, 2004, Pages 414-425

  Pawloski, Adam R ^a   Acheta, Alden ^a   Lalović, Ivan ^a   La Fontaine, Bruno ^a   Levinson, Harry J ^a  

^a ADVANCED MICRO DEVICES   (United States)

Author keywords

Aerial image contrast; Image log slope (ILS); Intrinsic bias; Line edge roughness (LER); Photoresist; Resist edge log slope (RELS)

Indexed keywords

APPROXIMATION THEORY; DISSOLUTION; DOSIMETRY; IMAGE ANALYSIS; LIGHTING; MACROMOLECULES; POLYMERS; SPURIOUS SIGNAL NOISE;

AERIAL IMAGE CONTRAST; IMAGE-LOG-SLOPE (ILS); INTRINSIC BIAS; LINE-EDGE ROUGHNESS (LER); RESIST EDGE-LOG-SLOPE (RELS);

PHOTORESISTS;

EID: 3843151399     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.537103     Document Type: Conference Paper

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